| Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM U Russo, D Ielmini, C Cagli, AL Lacaita, S Spiga, C Wiemer, M Perego, ... 2007 IEEE International Electron Devices Meeting, 775-778, 2007 | 245 | 2007 |
| Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia Chemistry of materials 18 (16), 3764-3773, 2006 | 184 | 2006 |
| Atomic-layer deposition of G Scarel, E Bonera, C Wiemer, G Tallarida, S Spiga, M Fanciulli, ... Applied physics letters 85 (4), 630-632, 2004 | 131 | 2004 |
| Electronic states and mechanical properties in transition metal nitrides F Lévy, P Hones, PE Schmid, R Sanjinés, M Diserens, C Wiemer Surface and coatings technology 120, 284-290, 1999 | 102 | 1999 |
| Amorphization dynamics of films upon nano- and femtosecond laser pulse irradiation J Siegel, W Gawelda, D Puerto, C Dorronsoro, J Solis, CN Afonso, ... Journal of Applied Physics 103 (2), 023516, 2008 | 90 | 2008 |
| Combining grazing incidence X-ray diffraction and X-ray reflectivity for the evaluation of the structural evolution of HfO2 thin films with annealing C Wiemer, S Ferrari, M Fanciulli, G Pavia, L Lutterotti Thin Solid Films 450 (1), 134-137, 2004 | 76 | 2004 |
| Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on EK Evangelou, C Wiemer, M Fanciulli, M Sethu, W Cranton Journal of applied physics 94 (1), 318-325, 2003 | 73 | 2003 |
| Thermal characterization of the interface from room temperature up to JL Battaglia, A Kusiak, V Schick, A Cappella, C Wiemer, M Longo, ... Journal of Applied Physics 107 (4), 044314, 2010 | 72 | 2010 |
| Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition S Spiga, A Lamperti, C Wiemer, M Perego, E Cianci, G Tallarida, HL Lu, ... Microelectronic Engineering 85 (12), 2414-2419, 2008 | 71 | 2008 |
| Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” E Ahvenniemi, AR Akbashev, S Ali, M Bechelany, M Berdova, S Boyadjiev, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (1 …, 2017 | 69 | 2017 |
| Thermal and electrical characterization of materials for phase-change memory cells R Fallica, JL Battaglia, S Cocco, C Monguzzi, A Teren, C Wiemer, ... Journal of Chemical & Engineering Data 54 (6), 1698-1701, 2009 | 67 | 2009 |
| Ru and RuO2 gate electrodes for advanced CMOS technology K Fröhlich, K Husekova, D Machajdik, JC Hooker, N Perez, M Fanciulli, ... Materials Science and Engineering: B 109 (1-3), 117-121, 2004 | 67 | 2004 |
| high- gate dielectric grown directly on by molecular-beam epitaxy A Dimoulas, G Vellianitis, G Mavrou, G Apostolopoulos, A Travlos, ... Applied physics letters 85 (15), 3205-3207, 2004 | 66 | 2004 |
| Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment P Colombi, DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, ... Journal of Applied Crystallography 41 (1), 143-152, 2008 | 64 | 2008 |
| High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD A Cappella, JL Battaglia, V Schick, A Kusiak, A Lamperti, C Wiemer, ... Advanced Engineering Materials 15 (11), 1046-1050, 2013 | 60 | 2013 |
| Atomic layer deposition of NiO films on Si (100) using cyclopentadienyl-type compounds and ozone as precursors HL Lu, G Scarel, C Wiemer, M Perego, S Spiga, M Fanciulli, G Pavia Journal of The Electrochemical Society 155 (10), H807, 2008 | 60 | 2008 |
| Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, O Salicio, A Pirovano, ... Chemistry of Materials 20 (11), 3557-3559, 2008 | 60 | 2008 |
| Nanoscale morphological and electrical homogeneity of and thin films studied by conducting atomic-force microscopy S Kremmer, H Wurmbauer, C Teichert, G Tallarida, S Spiga, C Wiemer, ... Journal of applied physics 97 (7), 074315, 2005 | 60 | 2005 |
| Effects of the oxygen precursor on the electrical and structural properties of films grown by atomic layer deposition on Ge S Spiga, C Wiemer, G Tallarida, G Scarel, S Ferrari, G Seguini, M Fanciulli Applied Physics Letters 87 (11), 112904, 2005 | 59 | 2005 |
| Chlorine mobility during annealing in in and films grown by atomic layer deposition S Ferrari, G Scarel, C Wiemer, M Fanciulli Journal of applied physics 92 (12), 7675-7677, 2002 | 58 | 2002 |
