| A digital single-molecule nanopillar SERS platform for predicting and monitoring immune toxicities in immunotherapy J Li, A Wuethrich, AAI Sina, HH Cheng, Y Wang, A Behren, ... Nature communications 12 (1), 1087, 2021 | 78 | 2021 |
| Control of the Orientation of Symmetric Poly(styrene)-block-poly(d,l-lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition I Keen, A Yu, HH Cheng, KS Jack, TM Nicholson, AK Whittaker, I Blakey Langmuir 28 (45), 15876-15888, 2012 | 66 | 2012 |
| Single-crystalline 3C-SiC anodically bonded onto glass: an excellent platform for high-temperature electronics and bioapplications HP Phan, HH Cheng, T Dinh, B Wood, TK Nguyen, F Mu, H Kamble, ... ACS applied materials & interfaces 9 (33), 27365-27371, 2017 | 61 | 2017 |
| Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers KJ Lawrie, I Blakey, JP Blinco, HH Cheng, R Gronheid, KS Jack, ... Journal of Materials Chemistry 21 (15), 5629-5637, 2011 | 47 | 2011 |
| Behavior of lamellar forming block copolymers under nanoconfinement: implications for topography directed self-assembly of sub-10 nm structures I Keen, HH Cheng, A Yu, KS Jack, TR Younkin, MJ Leeson, AK Whittaker, ... Macromolecules 47 (1), 276-283, 2014 | 32 | 2014 |
| Using directed self assembly of block copolymer nanostructures to modulate nanoscale surface roughness: towards a novel lithographic process YM Chuang, KS Jack, HH Cheng, AK Whittaker, I Blakey Advanced Functional Materials 23 (2), 173-183, 2013 | 31 | 2013 |
| Free spectral range electrical tuning of a high quality on-chip microcavity C Bekker, CG Baker, R Kalra, HH Cheng, BB Li, V Prakash, WP Bowen Optics express 26 (26), 33649-33670, 2018 | 28 | 2018 |
| Unintentionally doped epitaxial 3C-SiC (111) nanothin film as material for highly sensitive thermal sensors at high temperatures T Dinh, HP Phan, TK Nguyen, V Balakrishnan, HH Cheng, L Hold, ... IEEE Electron Device Letters 39 (4), 580-583, 2018 | 27 | 2018 |
| Can ionic liquid additives be used to extend the scope of poly (styrene)-block-poly (methyl methacrylate) for directed self-assembly? TM Bennett, K Pei, HH Cheng, KJ Thurecht, KS Jack, I Blakey Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (3), 031304-031304, 2014 | 26 | 2014 |
| Electron-beam writing of deoxygenated micro-patterns on graphene oxide film KH Wu, HH Cheng, AA Mohammad, I Blakey, K Jack, IR Gentle, ... Carbon 95, 738-745, 2015 | 25 | 2015 |
| Aqueous developable dual switching photoresists for nanolithography L Chen, YK Goh, HH Cheng, BW Smith, P Xie, W Montgomery, ... Journal of Polymer Science Part A: Polymer Chemistry 50 (20), 4255-4265, 2012 | 22 | 2012 |
| The fabrication and characterisation of metallic nanotransistors HH Cheng, CN Andrew, MM Alkaisi Microelectronic engineering 83 (4-9), 1749-1752, 2006 | 18 | 2006 |
| Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate Z Jiang, MM Alam, HH Cheng, I Blakey, AK Whittaker Nanoscale advances 1 (8), 3078-3085, 2019 | 14 | 2019 |
| Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers YM Chuang, HH Cheng, K Jack, A Whittaker, I Blakey Alternative Lithographic Technologies V 8680, 23-32, 2013 | 10 | 2013 |
| EUVL compatible LER solutions using functional block copolymers HH Cheng, I Keen, A Yu, YM Chuang, I Blakey, KS Jack, MJ Leeson, ... Alternative Lithographic Technologies IV 8323, 346-356, 2012 | 10 | 2012 |
| Plasmonic ‘top-hat’nano-star arrays by electron beam lithography S Zhu, HH Cheng, I Blakey, N Stokes, KK Ostrikov, M Cortie Microelectronic Engineering 139, 13-18, 2015 | 9 | 2015 |
| Electron-beam-induced freezing of an aromatic-based EUV resist: A robust template for directed self-assembly of block copolymers HH Cheng, A Yu, I Keen, YM Chuang, KS Jack, MJ Leeson, TR Younkin, ... IEEE transactions on nanotechnology 11 (6), 1140-1147, 2012 | 9 | 2012 |
| Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability Z Jiang, HH Cheng, I Blakey, AK Whittaker Molecular Systems Design & Engineering 3 (4), 627-635, 2018 | 7 | 2018 |
| Extending the scope of poly (styrene)-block-poly (methyl methacrylate) for directed self-assembly T Bennett, K Pei, HH Cheng, KJ Thurecht, KS Jack, I Blakey Alternative Lithographic Technologies VI 9049, 127-138, 2014 | 5 | 2014 |
| Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications HH Cheng, I Keen, A Yu, YM Chuang, I Blakey, KS Jack, MJ Leeson, ... Alternative Lithographic Technologies III 7970, 414-422, 2011 | 5 | 2011 |
Idriss BlakeyThe University of QueenslandAdresse e-mail validée de uq.edu.au
