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Jan Trieschmann
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The 2022 Plasma Roadmap: low temperature plasma science and technology
I Adamovich, S Agarwal, E Ahedo, LL Alves, S Baalrud, N Babaeva, ...
Journal of Physics D: Applied Physics 55 (37), 373001, 2022
2022022
Electron dynamics in low pressure capacitively coupled radio frequency discharges
S Wilczek, J Schulze, RP Brinkmann, Z Donkó, J Trieschmann, ...
Journal of Applied Physics 127 (18), 2020
972020
The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges
S Wilczek, J Trieschmann, J Schulze, E Schuengel, RP Brinkmann, ...
Plasma Sources Science and Technology 24 (2), 024002, 2015
912015
Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas
S Wilczek, J Trieschmann, D Eremin, RP Brinkmann, J Schulze, ...
Physics of Plasmas 23 (6), 2016
792016
The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single-and dual-frequency capacitively …
M Daksha, A Derzsi, S Wilczek, J Trieschmann, T Mussenbrock, ...
Plasma Sources Science and Technology 26 (8), 085006, 2017
512017
Ion energy distribution functions behind the sheaths of magnetized and non-magnetized radio frequency discharges
J Trieschmann, M Shihab, D Szeremley, S Gallian, D Eremin, ...
Journal of Physics D: Applied Physics 46 (8), 084016, 2013
512013
Machine learning plasma-surface interface for coupling sputtering and gas-phase transport simulations
F Krüger, T Gergs, J Trieschmann
Plasma Sources Science and Technology 28 (3), 035002, 2019
362019
Plasma polymerization at different positions in an asymmetric ethylene discharge
J Trieschmann, D Hegemann
Journal of Physics D: Applied Physics 44 (47), 475201, 2011
362011
Disparity between current and voltage driven capacitively coupled radio frequency discharges
S Wilczek, J Trieschmann, J Schulze, Z Donko, RP Brinkmann, ...
Plasma Sources Science and Technology 27 (12), 125010, 2018
342018
Kinetic simulation of filament growth dynamics in memristive electrochemical metallization devices
S Dirkmann, M Ziegler, M Hansen, H Kohlstedt, J Trieschmann, ...
Journal of Applied Physics 118 (21), 2015
322015
Multi frequency matching for voltage waveform tailoring
F Schmidt, J Schulze, E Johnson, JP Booth, D Keil, DM French, ...
Plasma Sources Science and Technology 27 (9), 095012, 2018
302018
2022 review of data-driven plasma science
R Anirudh, R Archibald, MS Asif, MM Becker, S Benkadda, PT Bremer, ...
IEEE Transactions on Plasma Science, 2023
292023
On the physics of a large CCP discharge
D Eremin, S Bienholz, D Szeremley, J Trieschmann, S Ries, P Awakowicz, ...
Plasma Sources Science and Technology 25 (2), 025020, 2016
262016
The influence of the relative phase between the driving voltages on electron heating in asymmetric dual frequency capacitive discharges
D Ziegler, J Trieschmann, T Mussenbrock, RP Brinkmann, J Schulze, ...
Plasma Sources Science and Technology 19 (4), 045001, 2010
262010
Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor
K Bobzin, RP Brinkmann, T Mussenbrock, N Bagcivan, RH Brugnara, ...
Surface and Coatings Technology 237, 176-181, 2013
252013
Transport of sputtered particles in capacitive sputter sources
J Trieschmann, T Mussenbrock
Journal of Applied Physics 118 (3), 2015
232015
Experimental retrieval of the kinetic parameters of a dye in a solid film
J Trieschmann, S Xiao, LJ Prokopeva, VP Drachev, AV Kildishev
Optics Express 19 (19), 18253-18259, 2011
222011
Consistent simulation of capacitive radio-frequency discharges and external matching networks
F Schmidt, T Mussenbrock, J Trieschmann
Plasma Sources Science and Technology 27 (10), 105017, 2018
202018
Analytic model of the energy distribution function for highly energetic electrons in magnetron plasmas
S Gallian, J Trieschmann, T Mussenbrock, RP Brinkmann, WNG Hitchon
Journal of Applied Physics 117 (2), 2015
202015
Correlation between sputter deposition parameters and IV characteristics in double-barrier memristive devices
F Zahari, F Schlichting, J Strobel, S Dirkmann, J Cipo, S Gauter, ...
Journal of Vacuum Science & Technology B 37 (6), 2019
172019
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