Suivre
Fred Wafula
Fred Wafula
Adresse e-mail validée de intel.com - Page d'accueil
Titre
Citée par
Citée par
Année
All electrochemical fabrication of a platinized nanoporous Au thin-film catalyst
DA McCurry, M Kamundi, M Fayette, F Wafula, N Dimitrov
ACS applied materials & interfaces 3 (11), 4459-4468, 2011
732011
Toward a Better Understanding of the Effect of Cu Electroplating Process Parameters on Cu3Sn Voiding
L Yin, F Wafula, N Dimitrov, P Borgesen
Journal of electronic materials 41, 302-312, 2012
462012
Mechanism of cobalt bottom-up filling for advanced node interconnect metallization
J Wu, F Wafula, S Branagan, H Suzuki, J van Eisden
Journal of the Electrochemical Society 166 (1), D3136, 2018
362018
Impact of key deposition parameters on the voiding sporadically occurring in solder joints with electroplated copper
F Wafula, Y Liu, L Yin, S Bliznakov, P Borgesen, EJ Cotts, N Dimitrov
Journal of The Electrochemical Society 157 (2), D111, 2009
362009
Effect of the deposition parameters on the voiding propensity of solder joints with Cu electroplated in a Hull cell
F Wafula, Y Liu, L Yin, P Borgesen, EJ Cotts, N Dimitrov
Journal of applied electrochemistry 41, 469-480, 2011
322011
Controlling Cu electroplating to prevent sporadic voiding in Cu3Sn
L Yin, P Kondos, P Borgesen, Y Liu, S Bliznakov, F Wafula, N Dimitrov, ...
2009 59th Electronic Components and Technology Conference, 406-414, 2009
262009
Influence of poly (ethylene glycol) degradation on voiding sporadically occurring in solder joints with electroplated Cu
F Wafula, L Yin, P Borgesen, D Andala, N Dimitrov
Journal of electronic materials 41, 1898-1906, 2012
252012
Electrolytic cobalt fill of sub-5 nm node interconnect features
F Wafula, J Wu, S Branagan, H Suzuki, A Gracias, J van Eisden
2018 IEEE International Interconnect Technology Conference (IITC), 123-125, 2018
72018
Impact of Bath Stability on Electroplated Cu for Through-Silicon Vias in a Controlled Manufacturing Environment
A Nguyen, K Fealey, P Reilly, G Pattanaik, A Gracias, F Wafula, M Flynn, ...
Journal of Microelectronics and Electronic Packaging 12 (1), 43-49, 2015
52015
Understanding, Controlling and Minimizing the Voiding, Sporadically Occurring in Solder Joints with Electroplated Copper
F Wafula, Y Liu, L Yin, S Bliznakov, P Borgesen, E Cotts, N Dimitrov
ECS Transactions 19 (24), 43, 2009
42009
Short Loop Electrical And Reliability Learning For Through Silicon Via (TSV) Mid-Wafer Front-Side Processes
V Vartanian, K Hummler, S Olson, T Barbera, KH Yu, S Hu, A Fujita, ...
International Symposium on Microelectronics 2014 (1), 000794-000803, 2014
22014
Direct Cu plating of high aspect ratio through silicon vias (TSVs) with Ru seed on 300 mm wafer
F Wafula, G Pattanaik, J Enloe, K Hummler, B Sapp
IEEE International Interconnect Technology Conference, 143-146, 2014
22014
(Invited) Cobalt Bottom-up Filling for Advanced Node Interconnect Metallization
J Wu, F Wafula, S Branagan, H Suzuki, J van Eisden
Electrochemical Society Meeting Abstracts 235, 1050-1050, 2019
2019
AQUEOUS COMPOSITION FOR DEPOSITING A COBALT DEPOSIT AND METHOD FOR ELECTROLYTICALLY DEPOSITING SUCH A DEPOSIT
F WAFULA, J ADOLF, J WU, J GAIDA, D ROHDE, G VAZHENIN
WO Patent WO/2019/013,761, 2019
2019
Cost Analysis of TSV Process and Scaling Options
V Vartanian, L Smith, K Hummler, S Olson, B Sapp, T Barbera, S Golovato, ...
International Symposium on Microelectronics 2014 (1), 000001-000007, 2014
2014
Complete Electrochemical Fabrication of a Platinized Nanoporous Au Catalyst for Formic Acid Oxidation
N Dimitrov, D McCurry, M Kamundi, M Fayette, F Wafula
ECS Meeting Abstracts, 2280, 2011
2011
Electroanalytical Approaches to Understand and Control Voiding Sporadically Occurring in Solder Joints with Electroplated Copper
FW Wafula
State University of New York at Binghamton, Department of Chemistry, 2011
2011
Understanding, Controlling and Minimizing the Voiding, Sporadically Occurring in Solder Joints with Electroplated Copper
N Dimitrov, Y Liu, F Wafula, S Bliznakov, E Cotts, L Yin, P Borgesen
ECS Meeting Abstracts, 975, 2009
2009
Le système ne peut pas réaliser cette opération maintenant. Veuillez réessayer plus tard.
Articles 1–18