Suivre
D Sanders
D Sanders
IBM Research
Adresse e-mail validée de us.ibm.com
Titre
Citée par
Citée par
Année
A general model for selectivity in olefin cross metathesis
AK Chatterjee, TL Choi, DP Sanders, RH Grubbs
Journal of the American Chemical Society 125 (37), 11360-11370, 2003
20092003
Prevention of undesirable isomerization during olefin metathesis
SH Hong, DP Sanders, CW Lee, RH Grubbs
Journal of the American Chemical Society 127 (49), 17160-17161, 2005
8012005
Dense self-assembly on sparse chemical patterns: rectifying and multiplying lithographic patterns using block copolymers
JK Cheng, CT Rettner, DP Sanders, HC Kim, WD Hinsberg
Advanced Materials, 2008
4132008
Advances in patterning materials for 193 nm immersion lithography
DP Sanders
Chemical reviews 110 (1), 321-360, 2010
3162010
Nanoscale chemical imaging by photoinduced force microscopy
D Nowak, W Morrison, HK Wickramasinghe, J Jahng, E Potma, L Wan, ...
Science advances 2 (3), e1501571, 2016
3022016
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
JY Cheng, DP Sanders, HD Truong, S Harrer, A Friz, S Holmes, ...
ACS nano 4 (8), 4815-4823, 2010
2812010
Improved thermal and mechanical properties of polybenzoxazines based on alkyl‐substituted aromatic amines
H Ishida, DP Sanders
Journal of Polymer Science Part B: Polymer Physics 38 (24), 3289-3301, 2000
2422000
Synthesis of symmetrical trisubstituted olefins by cross metathesis
AK Chatterjee, DP Sanders, RH Grubbs
Organic Letters 4 (11), 1939-1942, 2002
2392002
A simple and efficient synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl ester intermediate
DP Sanders, K Fukushima, DJ Coady, A Nelson, M Fujiwara, M Yasumoto, ...
Journal of the American Chemical Society 132 (42), 14724-14726, 2010
2202010
Regioselectivity and network structure of difunctional alkyl-substituted aromatic amine-based polybenzoxazines
H Ishida, DP Sanders
Macromolecules 33 (22), 8149-8157, 2000
2002000
Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication
H Tsai, JW Pitera, H Miyazoe, S Bangsaruntip, SU Engelmann, CC Liu, ...
ACS nano 8 (5), 5227-5232, 2014
1752014
Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab
C Bencher, J Smith, L Miao, C Cai, Y Chen, JY Cheng, DP Sanders, ...
Alternative Lithographic Technologies III 7970, 93-101, 2011
1412011
Hydrogen‐Bonding Catalysts Based on Fluorinated Alcohol Derivatives for Living Polymerization
O Coulembier, DP Sanders, A Nelson, AN Hollenbeck, HW Horn, JE Rice, ...
Angewandte Chemie International Edition 48 (28), 5170-5173, 2009
1242009
Method of forming sub-lithographic features using directed self-assembly of polymers
J Cheng, K Lai, W Li, YH Na, C Rettner, DP Sanders, D Yang
US Patent 8,114,306, 2012
1132012
Accelerating materials discovery using artificial intelligence, high performance computing and robotics
EO Pyzer-Knapp, JW Pitera, PWJ Staar, S Takeda, T Laino, DP Sanders, ...
npj Computational Materials 8 (1), 84, 2022
1052022
Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
J Cheng, H Kim, CT Rettner, DP Sanders, R Sooriyakumaran, L Sundberg
US Patent 7,521,090, 2009
1042009
Methods of directed self-assembly, and layered structures formed therefrom
J Cheng, ME Colburn, S Harrer, WD Hinsberg, SJ Holmes, H Kim, ...
US Patent 8,623,458, 2014
982014
Regioselectivity of the ring-opening polymerization of monofunctional alkyl-substituted aromatic amine-based benzoxazines
H Ishida, DP Sanders
Polymer 42 (7), 3115-3125, 2001
862001
Accessing new materials through polymerization and modification of a polycarbonate with a pendant activated ester
AC Engler, JMW Chan, DJ Coady, JM O’Brien, H Sardon, A Nelson, ...
Macromolecules 46 (4), 1283-1290, 2013
842013
Directed self-assembly of silicon-containing block copolymer thin films
MJ Maher, CT Rettner, CM Bates, G Blachut, MC Carlson, WJ Durand, ...
ACS applied materials & interfaces 7 (5), 3323-3328, 2015
822015
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