Suivre
Agnes Roussy
Agnes Roussy
Mines Saint Etienne - une école de l'IMT
Adresse e-mail validée de emse.fr
Titre
Citée par
Citée par
Année
NbN multilayer technology on R-plane sapphire
JC Villegirr, N Hadacek, S Monso, B Delnet, A Roussy, P Febvre, ...
IEEE transactions on applied superconductivity 11 (1), 68-71, 2001
552001
Virtual metrology models for predicting physical measurement in semiconductor manufacturing
A Ferreira, A Roussy, L Condé
2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 149-154, 2009
432009
Formation mechanisms of Cu (In, Ga) Se2 solar cells prepared from electrodeposited precursors
F Oliva, C Broussillou, M Annibaliano, N Frederich, PP Grand, A Roussy, ...
Thin Solid Films 535, 127-132, 2013
352013
Virtual metrology modeling for cvd film thickness
J Besnard, D Gleispach, H Gris, A Ferreira, A Roussy, C Kernaflen, ...
International Journal of Control Science and Engineering 2 (3), 26-33, 2012
342012
A structure data-driven framework for virtual metrology modeling
WT Yang, J Blue, A Roussy, J Pinaton, MS Reis
IEEE Transactions on Automation Science and Engineering 17 (3), 1297-1306, 2019
212019
Tool condition diagnosis with a recipe-independent hierarchical monitoring scheme
J Blue, D Gleispach, A Roussy, P Scheibelhofer
IEEE transactions on semiconductor manufacturing 26 (1), 82-91, 2012
202012
An interpretable unsupervised Bayesian network model for fault detection and diagnosis
WT Yang, MS Reis, V Borodin, M Juge, A Roussy
Control Engineering Practice 127, 105304, 2022
162022
Virtual metrology models for predicting avera PECVD oxide film thickne
A Ferreira, A Roussy, C Kernaflen, D Gleispach, G Hayderer, H Gris, ...
2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 1-6, 2011
142011
A physics-informed Run-to-Run control framework for semiconductor manufacturing
WT Yang, J Blue, A Roussy, J Pinaton, MS Reis
Expert Systems with Applications 155, 113424, 2020
122020
Feedforward Run-to-Run Control for Reduced Parametric Transistor Variation in CMOS Logic 0.13 Technology
N Jedidi, P Sallagoity, A Roussy, S Dauzère-Pérès
IEEE transactions on semiconductor manufacturing 24 (2), 273-279, 2011
122011
Efficient FDC based on hierarchical tool condition monitoring scheme
J Blue, A Roussy, A Thieullen, J Pinaton
2012 SEMI Advanced Semiconductor Manufacturing Conference, 359-364, 2012
112012
On-chip high-frequency diagnostic of RSFQ logic cells
PS Febvre, JC Berthet, D Ney, A Roussy, JW Tao, G Angenieux, ...
IEEE Transactions on Applied Superconductivity 11 (1), 284-287, 2001
92001
HTS pulse-stretcher and second order modulator: Design and first results
A Roussy, S Karthikeyan, I Oomen, T Ortlepp, EH Sujiono, A Brinkman, ...
IEEE transactions on applied superconductivity 15 (2), 457-460, 2005
72005
Virtual metrology for semiconductor manufacturing: Focus on transfer learning
R Clain, V Borodin, M Juge, A Roussy
2021 IEEE 17th International conference on automation science and …, 2021
62021
A hybrid feature selection approach for virtual metrology: Application to CMP process
TE KORABI, V BORODIN, J Michel, A ROUSSY
2021 32nd Annual SEMI advanced semiconductor manufacturing conference (ASMC …, 2021
62021
Virtual metrology modeling based on gaussian bayesian network
WT Yang, J Blue, A Roussy, MS Reis, J Pinaton
2018 Winter Simulation Conference (WSC), 3574-3582, 2018
52018
Run-To-Run sensor variation monitoring for process fault diagnosis in semiconductor manufacturing
J Blue, A Roussy, J Pinaton
2016 Winter Simulation Conference (WSC), 2523-2534, 2016
42016
Critical sensitivity of flash gate dimension spread on electrical performances for advanced embedded memory
A Roussy, M Bocquet, M Bileci, S Bégouin, A Marchadier
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015
42015
Implementation of MIMO R2R control regulation on furnaces processes
B Richard, A Roussy, L Brun, D Pompier, C Alegret, J Pinaton
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 143-148, 2010
42010
New developments in textured and epitaxial NbN superconducting layers for ultimate sensors and RSFQ digital circuits
L Villégier, Hadacek, Jorel,Thomassin, Bouchiat, Faucher, Febvre, Roussy
J. Phys. IV 12 (3), 129 - 132, 2002
4*2002
Le système ne peut pas réaliser cette opération maintenant. Veuillez réessayer plus tard.
Articles 1–20