Suivre
Fuchun Jia
Fuchun Jia
School of Microelectronics, Xidian University
Adresse e-mail validée de stu.xidian.edu.cn
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The DC performance and RF characteristics of GaN-based HEMTs improvement using graded AlGaN back barrier and Fe/C Co-doped buffer
L Yang, B Hou, F Jia, M Zhang, M Wu, X Niu, H Lu, C Shi, M Mi, Q Zhu, ...
IEEE Transactions on Electron Devices 69 (8), 4170-4174, 2022
162022
The influence of Fe doping tail in unintentionally doped GaN layer on DC and RF performance of AlGaN/GaN HEMTs
F Jia, X Ma, L Yang, B Hou, M Zhang, Q Zhu, M Wu, M Mi, J Zhu, S Liu, ...
IEEE Transactions on Electron Devices 68 (12), 6069-6075, 2021
152021
High current and linearity AlGaN/GaN/-graded-AlGaN: Si-doped/GaN heterostructure for low voltage power amplifier application
Q Yu, C Shi, L Yang, H Lu, M Zhang, M Wu, B Hou, F Jia, F Guo, X Ma, ...
IEEE Electron Device Letters 44 (4), 582-585, 2023
92023
High Vth and Improved Gate Reliability in P-GaN Gate HEMTs with Oxidation Interlayer
M Jia, B Hou, L Yang, F Jia, X Niu, J Du, Q Chang, M Zhang, M Wu, ...
IEEE Electron Device Letters, 2023
82023
Improved breakdown voltage and low damage E-mode operation of AlON/AlN/GaN HEMTs using plasma oxidation treatment
S Liu, J Zhu, J Guo, K Cheng, M Mi, L Qin, J Liu, F Jia, H Lu, X Ma, Y Hao
IEEE Electron Device Letters 43 (10), 1621-1624, 2022
62022
Transducer-less thermoreflectance technique for measuring thermal properties of the buried buffer layer and interface in GaN-based HEMTs
C Yuan, B Meng, Y Mao, M Wu, F Jia, L Yang, X Ma, Y Hao
ACS Applied Electronic Materials 4 (12), 5984-5995, 2022
52022
Analytical model on the threshold voltage of p-channel heterostructure field-effect transistors on a GaN-based complementary circuit platform
X Niu, B Hou, L Yang, M Zhang, X Zhang, H Lu, F Jia, J Du, M Wu, F Song, ...
IEEE Transactions on Electron Devices 69 (1), 57-62, 2021
52021
High-Efficiency AlGaN/GaN/Graded-AlGaN/GaN Double-Channel HEMTs for Sub-6G Power Amplifier Applications
C Shi, L Yang, M Zhang, M Wu, B Hou, H Lu, F Jia, F Guo, W Liu, Q Yu, ...
IEEE Transactions on Electron Devices 70 (5), 2241-2246, 2023
42023
930V and Low-Leakage Current GaN-on-Si Quasi-Vertical PiN Diode With Beveled-Sidewall Treated by Self-Aligned Fluorine Plasma
F Jia, X Ma, L Yang, X Zhang, B Hou, M Zhang, M Wu, X Niu, J Du, S Liu, ...
IEEE Electron Device Letters 43 (9), 1400-1403, 2022
42022
Influence of Mg Out‐Diffusion Effect on the Threshold Voltage of GaN‐Based p‐Channel Heterostructure Field‐Effect Transistors
X Niu, X Ma, M Zhang, L Yang, B Hou, M Wu, F Jia, X Zhang, C Wang, ...
physica status solidi (b) 260 (5), 2200278, 2023
32023
Record Power Performance of 33.1 W/mm with 62.9% PAE at X-band and 14.4 W/mm at Ka-band from AlGaN/GaN/AlN: Fe Heterostucture
L Yang, F Jia, H Lu, B Hou, M Zhang, J Du, Q Chang, L Deng, Q Yu, S Li, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
22023
Improved device performance of recessed-gate AlGaN/GaN HEMTs by using in-situ N2O radical treatment
X Zhang, M Wu, B Hou, X Niu, H Lu, F Jia, M Zhang, J Du, L Yang, X Ma, ...
Chinese Physics B 31 (5), 057301, 2022
12022
Novel GaN-based double-channel p-heterostructure field-effect transistors with a p-GaN insertion layer
X Niu, B Hou, M Zhang, L Yang, M Wu, X Zhang, F Jia, C Wang, X Ma, ...
Chinese Physics B 32 (10), 108101, 2023
2023
Enhancement-mode AlGaN/GaN HEMTs with a semi-wraparound metal-insulator-semiconductor gate
M Jia, B Hou, FC Jia, L Yang, JP Ao, XH Ma
2022 10th International Symposium on Next-Generation Electronics (ISNE), 1-3, 2023
2023
The Improvement Breakdown Voltage of GaN on Si Pin Diode by Stepped Sidewall Treated with Fluorine Plasma
F Jia, Q Chang, X Chen, B Hou, L Yang, X Ma
2022 IEEE 2nd International Conference on Computer Systems (ICCS), 136-139, 2022
2022
High power-added-efficiency AlGaN/GaN HEMTs fabricated by atomic level controlled etching
X Zhang, B Hou, F Jia, H Lu, X Niu, M Wu, M Zhang, J Du, L Yang, X Ma, ...
Chinese Physics B 31 (2), 027301, 2022
2022
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