Suivre
Krishna K. Bhuwalka
Krishna K. Bhuwalka
Autres nomsK. K. Bhuwalka, K. Bhuwalka
Belgium Research Center, Huawei
Adresse e-mail validée de huawei.com
Titre
Citée par
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Année
Scaling the vertical tunnel FET with tunnel bandgap modulation and gate workfunction engineering
KK Bhuwalka, J Schulze, I Eisele
IEEE transactions on electron devices 52 (5), 909-917, 2005
3952005
Vertical tunnel field-effect transistor
KK Bhuwalka, S Sedlmaier, AK Ludsteck, C Tolksdorf, J Schulze, I Eisele
IEEE Transactions on Electron Devices 51 (2), 279-282, 2004
3292004
Performance enhancement of vertical tunnel field-effect transistor with SiGe in the δp+ layer
KK Bhuwalka, J Schulze, I Eisele
Japanese Journal of Applied Physics 43 (7R), 4073, 2004
2822004
3nm GAA technology featuring multi-bridge-channel FET for low power and high performance applications
G Bae, DI Bae, M Kang, SM Hwang, SS Kim, B Seo, TY Kwon, TJ Lee, ...
2018 IEEE International Electron Devices Meeting (IEDM), 28.7. 1-28.7. 4, 2018
2272018
A simulation approach to optimize the electrical parameters of a vertical tunnel FET
KK Bhuwalka, J Schulze, I Eisele
IEEE transactions on electron devices 52 (7), 1541-1547, 2005
1732005
Fabrication and Analysis of a Heterojunction Line Tunnel FET
AM Walke, A Vandooren, R Rooyackers, D Leonelli, A Hikavyy, R Loo, ...
IEEE Transactions on Electron Devices 61 (3), 707-715, 2014
1432014
P-channel tunnel field-effect transistors down to sub-50 nm channel lengths
KK Bhuwalka, M Born, M Schindler, M Schmidt, T Sulima, I Eisele
Japanese journal of applied physics 45 (4S), 3106, 2006
1312006
Fringing-Induced Drain Current Improvement in the Tunnel Field-Effect Transistor With High- Gate Dielectrics
M Schlosser, KK Bhuwalka, M Sauter, T Zilbauer, T Sulima, I Eisele
IEEE transactions on electron devices 56 (1), 100-108, 2008
1192008
Tunnel field-effect transistor with narrow band-gap channel and strong gate coupling
KK Bhuwalka, KI Goto
US Patent 7,812,370, 2010
922010
Demonstration of scaled Ge p-channel FinFETs integrated on Si
MJH Van Dal, G Vellianitis, G Doornbos, B Duriez, TM Shen, CC Wu, ...
2012 International Electron Devices Meeting, 23.5. 1-23.5. 4, 2012
852012
Tunnel FET: A CMOS device for high temperature applications
M Born, KK Bhuwalka, M Schindler, U Abelein, M Schmidt, T Sulima, ...
2006 25th international conference on microelectronics, 124-127, 2006
762006
Tunnel field-effect transistors with superlattice channels
KK Bhuwalka, CY Wang, KI Goto, WC Lee, CH Diaz
US Patent 7,834,345, 2010
652010
Improved reliability by reduction of hot-electron damage in the vertical impact-ionization MOSFET (I-MOS)
U Abelein, M Born, KK Bhuwalka, M Schindler, M Schlosser, T Sulima, ...
IEEE electron device letters 28 (1), 65-67, 2006
652006
Semiconductor device
KK Bhuwalka, SJ Kim, JC Kim, H Kim
US Patent 10,217,816, 2019
612019
An ultralow-resistance ultrashallow metallic source/drain contact scheme for III–V NMOS
R Oxland, SW Chang, X Li, SW Wang, G Radhakrishnan, W Priyantha, ...
IEEE electron device letters 33 (4), 501-503, 2012
602012
Scaled p-channel Ge FinFET with optimized gate stack and record performance integrated on 300mm Si wafers
B Duriez, G Vellianitis, MJH Van Dal, G Doornbos, R Oxland, ...
2013 IEEE International Electron Devices Meeting, 20.1. 1-20.1. 4, 2013
582013
InAs N-MOSFETs with record performance of Ion= 600 μA/μm at Ioff= 100 nA/μm (Vd= 0.5 V)
SW Chang, X Li, R Oxland, SW Wang, CH Wang, R Contreras-Guerrero, ...
2013 IEEE International Electron Devices Meeting, 16.1. 1-16.1. 4, 2013
472013
A novel vertical impact ionisation MOSFET (I-MOS) concept
U Abelein, M Born, KK Bhuwalka, M Schindler, M Schmidt, T Sulima, ...
2006 25th International Conference on Microelectronics, 121-123, 2006
432006
Tunnel FET and methods for forming the same
KK Bhuwalka, G Doornbos, M Passlack
US Patent 8,471,329, 2013
392013
InAs hole inversion and bandgap interface state density of 2× 1011 cm− 2 eV− 1 at HfO2/InAs interfaces
CH Wang, SW Wang, G Doornbos, G Astromskas, K Bhuwalka, ...
Applied Physics Letters 103 (14), 2013
382013
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