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alain esteve
alain esteve
Directeur de recherche CNRS, LAAS (NEO), Université de Toulouse
Adresse e-mail validée de laas.fr
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Multilayered Al/CuO thermite formation by reactive magnetron sputtering: Nano versus micro
M Petrantoni, C Rossi, L Salvagnac, V Conédéra, A Estève, C Tenailleau, ...
Journal of Applied Physics 108 (8), 084323, 2010
1812010
Nanoenergetics as pressure generator for nontoxic impact primers: Comparison of Al/Bi2O3, Al/CuO, Al/MoO3 nanothermites and Al/PTFE
L Glavier, G Taton, JM Ducéré, V Baijot, S Pinon, T Calais, A Estève, ...
Combustion and Flame 162 (5), 1813-1820, 2015
1642015
Nanopatterning Si (111) surfaces as a selective surface-chemistry route
DJ Michalak, SR Amy, D Aureau, M Dai, A Estève, YJ Chabal
Nature materials 9 (3), 266-271, 2010
1632010
High‐energy Al/CuO nanocomposites obtained by DNA‐directed assembly
F Severac, P Alphonse, A Estève, A Bancaud, C Rossi
Advanced Functional Materials 22 (2), 323-329, 2012
1552012
Interfacial chemistry in Al/CuO reactive nanomaterial and its role in exothermic reaction
J Kwon, JM Ducéré, P Alphonse, M Bahrami, M Petrantoni, JF Veyan, ...
ACS applied materials & interfaces 5 (3), 605-613, 2013
1112013
Infrared spectroscopic investigation of the reaction of hydrogen-terminated,(111)-oriented, silicon surfaces with liquid methanol
DJ Michalak, S Rivillon, YJ Chabal, A Esteve, NS Lewis
The Journal of Physical Chemistry B 110 (41), 20426-20434, 2006
802006
Density functional theory study of and decomposition on hydroxylated Initial stage of high-k atomic layer deposition
L Jeloaica, A Estève, M Djafari Rouhani, D Estève
Applied physics letters 83 (3), 542-544, 2003
792003
Investigation of Al/CuO multilayered thermite ignition
A Nicollet, G Lahiner, A Belisario, S Souleille, M Djafari-Rouhani, ...
Journal of Applied Physics 121 (3), 034503, 2017
732017
Nanoscale energetic materials
C Rossi, A Estève, P Vashishta
Journal of Physics and Chemistry of Solids 2 (71), 57-58, 2010
732010
Enhancing the reactivity of Al/CuO nanolaminates by Cu incorporation at the interfaces
L Marín, CE Nanayakkara, JF Veyan, B Warot-Fonrose, S Joulié, A Estève, ...
ACS Applied Materials & Interfaces 7 (22), 11713-11718, 2015
722015
A methodology for the kinetic Monte Carlo simulation of alumina atomic layer deposition onto silicon
G Mazaleyrat, A Estève, L Jeloaica, M Djafari-Rouhani
Computational materials science 33 (1-3), 74-82, 2005
602005
Investigation of the chemical purity of silicon surfaces reacted with liquid methanol
DJ Michalak, SR Amy, A Esteve, YJ Chabal
The Journal of Physical Chemistry C 112 (31), 11907-11919, 2008
572008
Multiscale Modeling of the Atomic Layer Deposition of HfO2 Thin Film Grown on Silicon: How to Deal with a Kinetic Monte Carlo Procedure
A Dkhissi, A Estève, C Mastail, S Olivier, G Mazaleyrat, L Jeloaica, ...
Journal of chemical theory and computation 4 (11), 1915-1927, 2008
552008
Speeding up the unique assets of atomic layer deposition
D Muñoz-Rojas, T Maindron, A Esteve, F Piallat, JCS Kools, JM Decams
Materials Today Chemistry 12, 96-120, 2019
532019
Fast circuit breaker based on integration of Al/CuO nanothermites
A Nicollet, L Salvagnac, V Baijot, A Estève, C Rossi
Sensors and Actuators A: Physical 273, 249-255, 2018
522018
On the early stage of aluminum oxidation: An extraction mechanism via oxygen cooperation
C Lanthony, JM Ducéré, MD Rouhani, A Hemeryck, A Estève, C Rossi
The Journal of chemical physics 137 (9), 094707, 2012
522012
Elementary surface chemistry during CuO/Al nanolaminate-thermite synthesis: copper and oxygen deposition on aluminum (111) surfaces
C Lanthony, M Guiltat, JM Ducéré, A Verdier, A Hémeryck, ...
ACS applied materials & interfaces 6 (17), 15086-15097, 2014
492014
A computational chemist approach to gas sensors: Modeling the response of SnO2 to CO, O2, and H2O Gases
JM Ducéré, A Hemeryck, A Estève, MD Rouhani, G Landa, P Ménini, ...
Journal of computational chemistry 33 (3), 247-258, 2012
462012
Structure and chemical characterization at the atomic level of reactions in Al/CuO multilayers
I Abdallah, J Zapata, G Lahiner, B Warot-Fonrose, J Cure, Y Chabal, ...
ACS Applied Energy Materials 1 (4), 1762-1770, 2018
422018
DFT investigation of HfCl4 decomposition on hydroxylated SiO2: first stage of HfO2 atomic layer deposition
A Estève, MD Rouhani, L Jeloaica, D Estève
Computational materials science 27 (1-2), 75-80, 2003
412003
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