| Standing wave and skin effects in large-area, high-frequency capacitive discharges MA Lieberman, JP Booth, P Chabert, JM Rax, MM Turner Plasma Sources Science and Technology 11 (3), 283, 2002 | 398 | 2002 |
| production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization G Cunge, JP Booth Journal of Applied Physics 85 (8), 3952-3959, 1999 | 224 | 1999 |
| Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry JP Booth, N Sadeghi Journal of applied physics 70 (2), 611-620, 1991 | 205 | 1991 |
| A novel electrostatic probe method for ion flux measurements NSJ Braithwaite, JP Booth, G Cunge Plasma Sources Science and Technology 5 (4), 677, 1996 | 196 | 1996 |
| radical production and loss in a reactive ion etching plasma: Fluorine rich conditions JP Booth, G Cunge, P Chabert, N Sadeghi Journal of Applied Physics 85 (6), 3097-3107, 1999 | 194 | 1999 |
| Spatially and temporally resolved laser‐induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma JP Booth, G Hancock, ND Perry, MJ Toogood Journal of applied physics 66 (11), 5251-5257, 1989 | 187 | 1989 |
| Ion flux nonuniformities in large-area high-frequency capacitive discharges A Perret, P Chabert, JP Booth, J Jolly, J Guillon, P Auvray Applied physics letters 83 (2), 243-245, 2003 | 156 | 2003 |
| Oxygen atom actinometry reinvestigated: Comparison with absolute measurements by resonance absorption at 130 nm JP Booth, O Joubert, J Pelletier, N Sadeghi Journal of applied physics 69 (2), 618-626, 1991 | 156 | 1991 |
| Electron beam pulses produced by helicon‐wave excitation AR Ellingboe, RW Boswell, JP Booth, N Sadeghi Physics of Plasmas 2 (6), 1807-1809, 1995 | 129 | 1995 |
| Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth Physical review letters 114 (12), 125002, 2015 | 127 | 2015 |
| Ion energy uniformity in high-frequency capacitive discharges A Perret, P Chabert, J Jolly, JP Booth Applied Physics Letters 86 (2), 2005 | 122 | 2005 |
| Electron heating in capacitively coupled plasmas revisited T Lafleur, P Chabert, JP Booth Plasma Sources Science and Technology 23 (3), 035010, 2014 | 109 | 2014 |
| Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy JP Booth, G Cunge, F Neuilly, N Sadeghi Plasma Sources Science and Technology 7 (3), 423, 1998 | 108 | 1998 |
| Optical and electrical diagnostics of fluorocarbon plasma etching processes JP Booth Plasma Sources Science and Technology 8 (2), 249, 1999 | 105 | 1999 |
| Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux JP Booth, G Curley, D Marić, P Chabert Plasma Sources Science and Technology 19 (1), 015005, 2009 | 98 | 2009 |
| Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring T Lafleur, PA Delattre, EV Johnson, JP Booth Applied Physics Letters 101 (12), 2012 | 97 | 2012 |
| Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms T Lafleur, RW Boswell, JP Booth Applied Physics Letters 100 (19), 2012 | 93 | 2012 |
| Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma JP Booth, G Hancock, ND Perry Applied physics letters 50 (6), 318-319, 1987 | 93 | 1987 |
| Chemical kinetics in an atmospheric pressure helium plasma containing humidity S Schröter, A Wijaikhum, AR Gibson, A West, HL Davies, N Minesi, ... Physical Chemistry Chemical Physics 20 (37), 24263-24286, 2018 | 91 | 2018 |
| Secondary electron induced asymmetry in capacitively coupled plasmas T Lafleur, P Chabert, JP Booth Journal of Physics D: Applied Physics 46 (13), 135201, 2013 | 88 | 2013 |
Pascal ChabertDirecteur de Recherche CNRSVerified email at lpp.polytechnique.fr
