| All-fiber optical magnetic-field sensor based on Faraday rotation in highly terbium-doped fiber L Sun, S Jiang, JR Marciante Optics express 18 (6), 5407-5412, 2010 | 212 | 2010 |
| A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels R Xie, P Montanini, K Akarvardar, N Tripathi, B Haran, S Johnson, T Hook, ... 2016 IEEE international electron devices meeting (IEDM), 2.7. 1-2.7. 4, 2016 | 175 | 2016 |
| Compact all-fiber optical Faraday components using 65-wt%-terbium–doped fiber with a record Verdet constant of− 32 rad/(Tm) L Sun, S Jiang, JR Marciante Optics express 18 (12), 12191-12196, 2010 | 76 | 2010 |
| Effective Verdet constant in a terbium-doped-core phosphate fiber L Sun, S Jiang, JD Zuegel, JR Marciante Optics letters 34 (11), 1699-1701, 2009 | 51 | 2009 |
| All-fiber optical isolator based on Faraday rotation in highly terbium-doped fiber L Sun, S Jiang, JD Zuegel, JR Marciante Optics letters 35 (5), 706-708, 2010 | 49 | 2010 |
| Line-edge roughness performance targets for EUV lithography TA Brunner, X Chen, A Gabor, C Higgins, L Sun, CA Mack Extreme Ultraviolet (EUV) Lithography VIII 10143, 48-57, 2017 | 45 | 2017 |
| Insertion strategy for EUV lithography O Wood, J Arnold, T Brunner, M Burkhardt, JHC Chen, D Civay, SSC Fan, ... Extreme Ultraviolet (EUV) Lithography III 8322, 32-39, 2012 | 40 | 2012 |
| EUV patterning successes and frontiers N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016 | 39 | 2016 |
| Scattering enhanced thin absorber for EUV reticle and a method of making L Sun, IIOR Wood US Patent 9,298,081, 2016 | 37 | 2016 |
| Fabry-perot thin absorber for euv reticle and a method of making L Sun, IIOR Wood US Patent App. 13/788,315, 2014 | 35 | 2014 |
| Switchable and tunable dual-wavelength erbium-doped fiber laser based on one fiber Bragg grating X Feng, L Sun, L Xiong, Y Liu, S Yuan, G Kai, X Dong Optical Fiber Technology 10 (3), 275-282, 2004 | 30 | 2004 |
| Beating frequency tunable dual-wavelength erbium-doped fiber laser with one fiber Bragg grating L Sun, X Feng, W Zhang, L Xiong, Y Liu, G Kai, S Yuan, X Dong IEEE Photonics Technology Letters 16 (6), 1453-1455, 2004 | 30 | 2004 |
| Intergrated circuit structure including single diffusion break abutting end isolation region, and methods of forming same Y Shi, L Sun, L Economikos, R Xie, L Liebmann, C Park, ... US Patent 10,388,652, 2019 | 21 | 2019 |
| Comparison of left and right side line edge roughness in lithography L Sun, N Saulnier, G Beique, E Verduijn, W Wang, Y Xu, H Tang, Y Chen, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 21 | 2016 |
| Thin absorber extreme ultraviolet photomask based on Ni–TaN nanocomposite material D Hay, P Bagge, I Khaw, L Sun, O Wood, Y Chen, R Kim, ZJ Qi, Z Shi Optics Letters 41 (16), 3791-3794, 2016 | 19 | 2016 |
| Metal-insulator-metal capacitors with dielectric inner spacers X Zhang, C Park, L Sun, Y Qi, R Augur US Patent 10,211,147, 2019 | 18 | 2019 |
| EUV processing and characterization for BEOL N Saulnier, Y Xu, W Wang, L Sun, LL Cheong, R Lallement, G Beique, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 234-245, 2015 | 18 | 2015 |
| Extreme ultraviolet masks having annealed light-absorptive borders and associated fabrication methods P Mangat, L Sun, O Kritsun US Patent 8,592,103, 2013 | 18 | 2013 |
| Line edge roughness frequency analysis for SAQP process L Sun, X Zhang, S Levi, A Ge, H Zhou, W Wang, N Krishnan, Y Chen, ... Optical Microlithography XXIX 9780, 247-252, 2016 | 17 | 2016 |
| Single-expose patterning development for EUV lithography A De Silva, K Petrillo, L Meli, JC Shearer, G Beique, L Sun, I Seshadri, ... Extreme Ultraviolet (EUV) Lithography VIII 10143, 311-319, 2017 | 16 | 2017 |
Shibin JiangAdValue Photonics IncAdresse e-mail validée de advaluephotonics.com
