Suivre
Minhan Mi
Minhan Mi
Adresse e-mail validée de xidian.edu.cn
Titre
Citée par
Citée par
Année
High RF performance AlGaN/GaN HEMT fabricated by recess-arrayed ohmic contact technology
Y Lu, X Ma, L Yang, B Hou, M Mi, M Zhang, J Zheng, H Zhang, Y Hao
IEEE Electron Device Letters 39 (6), 811-814, 2018
482018
Millimeter-wave power AlGaN/GaN HEMT using surface plasma treatment of access region
M Mi, XH Ma, L Yang, Y Lu, B Hou, J Zhu, M Zhang, HS Zhang, Q Zhu, ...
IEEE Transactions on Electron Devices 64 (12), 4875-4881, 2017
372017
Analysis of the breakdown characterization method in GaN-based HEMTs
SL Zhao, B Hou, WW Chen, MH Mi, JX Zheng, JC Zhang, XH Ma, Y Hao
IEEE Transactions on power electronics 31 (2), 1517-1527, 2015
372015
AlN/GaN/InGaN Coupling-Channel HEMTs for Improved gm and Gain Linearity
H Lu, B Hou, L Yang, X Niu, Z Si, M Zhang, M Wu, M Mi, Q Zhu, K Cheng, ...
IEEE Transactions on Electron Devices 68 (7), 3308-3313, 2021
342021
Influence of fin configuration on the characteristics of AlGaN/GaN fin-HEMTs
M Zhang, XH Ma, L Yang, M Mi, B Hou, Y He, S Wu, Y Lu, HS Zhang, ...
IEEE Transactions on Electron Devices 65 (5), 1745-1752, 2018
342018
90 nm gate length enhancement-mode AlGaN/GaN HEMTs with plasma oxidation technology for high-frequency application
MH Mi, XH Ma, L Yang, BH Bin-Hou, JJ Zhu, YL He, M Zhang, S Wu, ...
Applied Physics Letters 111 (17), 2017
312017
Enhanced gm and fT With High Johnson’s Figure-of-Merit in Thin Barrier AlGaN/GaN HEMTs by TiN-Based Source Contact Ledge
L Yang, M Mi, B Hou, H Zhang, J Zhu, Q Zhu, Y Lu, M Zhang, Y He, ...
IEEE Electron Device Letters 38 (11), 1563-1566, 2017
302017
High Channel Conductivity, Breakdown Field Strength, and Low Current Collapse in AlGaN/GaN/Si -Doped AlGaN/GaN:C HEMTs
L Yang, M Zhang, B Hou, M Mi, M Wu, Q Zhu, J Zhu, Y Lu, L Chen, X Zhou, ...
IEEE Transactions on Electron Devices 66 (3), 1202-1207, 2019
292019
Enhancement-mode AlGaN/GaN nanowire channel high electron mobility transistor with fluorine plasma treatment by ICP
Y He, M Mi, C Wang, X Zheng, M Zhang, H Zhang, J Wu, L Yang, P Zhang, ...
IEEE Electron Device Letters 38 (10), 1421-1424, 2017
292017
Influence of fin-like configuration parameters on the linearity of AlGaN/GaN HEMTs
P Wang, X Ma, M Mi, M Zhang, J Zhu, Y Zhou, S Wu, J Liu, L Yang, B Hou, ...
IEEE Transactions on Electron Devices 68 (4), 1563-1569, 2021
282021
Mechanism of improving forward and reverse blocking voltages in AlGaN/GaN HEMTs by using Schottky drain
SL Zhao, MH Mi, B Hou, J Luo, Y Wang, Y Dai, JC Zhang, XH Ma, Y Hao
Chinese Physics B 23 (10), 107303, 2014
262014
High linearity and high power performance with barrier layer of sandwich structure and Al0. 05GaN back barrier for X-band application
B Hou, L Yang, M Mi, M Zhang, C Yi, M Wu, Q Zhu, Y Lu, J Zhu, X Zhou, ...
Journal of Physics D: Applied Physics 53 (14), 145102, 2020
252020
A millimeter-wave AlGaN/GaN HEMT fabricated with transitional-recessed-gate technology for high-gain and high-linearity applications
S Wu, X Ma, L Yang, M Mi, M Zhang, M Wu, Y Lu, H Zhang, C Yi, Y Hao
IEEE Electron Device Letters 40 (6), 846-849, 2019
252019
Effect of gate length on breakdown voltage in AlGaN/GaN high-electron-mobility transistor
J Luo, SL Zhao, MH Mi, WW Chen, B Hou, JC Zhang, XH Ma, Y Hao
Chinese Physics B 25 (2), 027303, 2015
242015
Analysis of low voltage RF power capability on AlGaN/GaN and InAlN/GaN HEMTs for terminal applications
Y Zhou, J Zhu, M Mi, M Zhang, P Wang, Y Han, S Wu, J Liu, Q Zhu, ...
IEEE Journal of the Electron Devices Society 9, 756-762, 2021
202021
High performance millimeter-wave InAlN/GaN HEMT for low voltage RF applications via regrown Ohmic contact with contact ledge structure
Y Zhou, M Mi, M Yang, Y Han, P Wang, Y Chen, J Liu, C Gong, Y Lu, ...
Applied Physics Letters 120 (6), 2022
192022
High-performance enhancement-mode AlGaN/GaN high electron mobility transistors combined with TiN-based source contact ledge and two-step fluorine treatment
L Yang, B Hou, M Mi, Q Zhu, M Wu, J Zhu, Y Lu, M Zhang, L Chen, X Zhou, ...
IEEE Electron Device Letters 39 (10), 1544-1547, 2018
182018
Improved on-state performance of AlGaN/GaN Fin-HEMTs by reducing the length of the nanochannel
M Zhang, XH Ma, MH Mi, YL He, B Hou, JX Zheng, Q Zhu, LX Chen, ...
Applied Physics Letters 110 (19), 2017
182017
Investigation of enhancement-mode AlGaN/GaN nanowire channel high-electron-mobility transistor with oxygen-containing plasma treatment
Y He, C Wang, M Mi, M Zhang, Q Zhu, P Zhang, J Wu, H Zhang, X Zheng, ...
Applied Physics Express 10 (5), 056502, 2017
182017
0.9-A/mm, 2.6-V Flash-Like Normally-Off Al2O3/AlGaN/GaN MIS-HEMTs Using Charge Trapping Technique
B Hou, X Ma, J Zhu, L Yang, W Chen, M Mi, Q Zhu, L Chen, R Zhang, ...
IEEE Electron Device Letters 39 (3), 397-400, 2018
172018
Le système ne peut pas réaliser cette opération maintenant. Veuillez réessayer plus tard.
Articles 1–20