F. Delachat
F. Delachat
Ing. Ph.D . Nanofabrication, CEA Leti
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Properties of silicon nanoparticles embedded in SiNx deposited by microwave-PECVD
F Delachat, M Carrada, G Ferblantier, JJ Grob, A Slaoui
Nanotechnology 20 (41), 415608, 2009
Spectroscopic ellipsometry investigation of the optical properties of nanostructured films
AS Keita, AE Naciri, F Delachat, M Carrada, G Ferblantier, A Slaoui
Journal of Applied Physics 107 (9), 093516, 2010
Effect of annealing treatments on photoluminescence and charge storage mechanism in silicon-rich SiN x: H films
BS Sahu, F Delachat, A Slaoui, M Carrada, G Ferblantier, D Muller
Nanoscale research letters 6 (1), 1-10, 2011
Effect of the stoichiometry of Si-rich silicon nitride thin films on their photoluminescence and structural properties
TV Torchynska, JLC Espinola, EV Hernandez, L Khomenkova, F Delachat, ...
Thin Solid Films 581, 65-69, 2015
The structural and optical properties of SiO2/Si rich SiNx multilayers containing Si-ncs
F Delachat, M Carrada, G Ferblantier, JJ Grob, A Slaoui, H Rinnert
Nanotechnology 20 (27), 275608, 2009
Structural and optical properties of Si nanocrystals embedded in SiO2/SiNx multilayers
F Delachat, M Carrada, G Ferblantier, A Slaoui, C Bonafos, S Schamm, ...
Physica E: Low-dimensional Systems and Nanostructures 41 (6), 994-997, 2009
Thin film pc-Si by aluminium induced crystallization on metallic substrate
F Delachat, F Antoni, P Prathap, A Slaoui, C Cayron, C Ducros
EPJ Photovoltaics 4, 45102, 2013
Process highlights to enhance directed self-assembly contact patterning performances
A Gharbi, R Tiron, M Argoud, G Chamiot-Maitral, A Fouquet, C Lapeyre, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 043503, 2016
Dielectric functions of PECVD-grown silicon nanoscale inclusions within rapid thermal annealed silicon-rich silicon nitride films
AS Keita, AE Naciri, F Delachat, M Carrada, G Ferblantier, A Slaoui, ...
Thin Solid Films 519 (9), 2870-2873, 2011
Fabrication of buckling free ultrathin silicon membranes by direct bonding with thermal difference
F Delachat, C Constancias, F Fournel, C Morales, B Le Drogoff, M Chaker, ...
ACS nano 9 (4), 3654-3663, 2015
Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV
F Delachat, C Constancias, J Reche, B Dal'Zotto, L Pain, B Le Drogoff, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2014
Elaboration and characterization of Si-licon nanoparticles in silicon nitride for photovoltaic application
F Delachat
Ph. D. thesis, 2010
Advanced surface affinity control for DSA contact hole shrink applications
F Delachat, A Gharbi, PP Barros, M Argoud, C Lapeyre, S Bos, J Hazart, ...
Emerging Patterning Technologies 10144, 95-103, 2017
Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications
F Delachat, B Le Drogoff, C Constancias, S Delprat, E Gautier, M Chaker, ...
Nanotechnology 27 (2), 025304, 2015
Ellipsometric demonstration of the existence of a strong correlation between size distribution and optical responses of silicon nanoclusters in a nitride matrix
AS Keita, A En Naciri, F Delachat, M Carrada, G Ferblantier, A Slaoui
Applied Physics Letters 99 (13), 131903, 2011
Dielectric functions of Si nanoparticles within a silicon nitride matrix
AS Keita, AE Naciri, F Delachat, M Carrada, G Ferblantier, A Slaoui
physica status solidi c 7 (2), 418-422, 2010
X-ray characterization of contact holes for block copolymer lithography
DF Sunday, F Delachat, A Gharbi, G Freychet, CD Liman, R Tiron, ...
Journal of applied crystallography 52 (1), 106-114, 2019
Dependencies of bias tables to pattern density, critical dimension, global coordinates and pattern orientation for nanoimprint master manufacturing for the 200 mm wafer scale …
P Quemere, J Chartoire, F Delachat, F Boudaa, L Perraud, M May, ...
Design-Process-Technology Co-optimization for Manufacturability XII 10588, 47-54, 2018
Evaluation of anti-sticking layers performances for 200mm wafer scale Smart NILTM process through surface and defectivity characterizations
F Delachat, JC Phillipe, V Larrey, F Fournel, S Bos, H Teyssèdre, ...
Advances in Patterning Materials and Processes XXXV 10586, 119-126, 2018
An embedded neutral layer for advanced surface affinity control in grapho-epitaxy directed self-assembly
F Delachat, A Gharbi, P Pimenta-Barros, A Fouquet, G Claveau, ...
Nanoscale 10 (23), 10900-10910, 2018
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