Optimization of poly-di-methyl-siloxane (PDMS) substrates for studying cellular adhesion and motility D Fuard, T Tzvetkova-Chevolleau, S Decossas, P Tracqui, P Schiavone
Microelectronic Engineering 85 (5-6), 1289-1293, 2008
519 2008 The motility of normal and cancer cells in response to the combined influence of the substrate rigidity and anisotropic microstructure T Tzvetkova-Chevolleau, A Stéphanou, D Fuard, J Ohayon, P Schiavone, ...
Biomaterials 29 (10), 1541-1551, 2008
197 2008 Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy L Azarnouche, E Pargon, K Menguelti, M Fouchier, D Fuard, P Gouraud, ...
Journal of Applied Physics 111 (8), 2012
56 2012 High density plasma etching of low dielectric polymers in oxygen-based chemistries D Fuard, O Joubert, L Vallier, M Bonvalot
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001
46 2001 Assessment of different simplified resist models D Fuard, M Besacier, P Schiavone
Optical Microlithography XV 4691, 1266-1277, 2002
41 2002 Etch mechanisms of low dielectric constant polymers in high density plasmas: Impact of charging effects on profile distortion during the etching process D Fuard, O Joubert, L Vallier, M Assous, P Berruyer, R Blanc
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2001
41 2001 Measurement of residual thickness using scatterometry D Fuard, C Perret, V Farys, C Gourgon, P Schiavone
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
32 2005 Intracellular stresses in patterned cell assemblies M Moussus, C der Loughian, D Fuard, M Courçon, D Gulino-Debrac, ...
Soft Matter 10 (14), 2414-2423, 2014
30 2014 Validity of the diffused aerial image model: an assessment based on multiple test cases D Fuard, M Besacier, P Schiavone
Optical Microlithography XVI 5040, 1536-1543, 2003
27 2003 An inverse ellipsometric problem for thin film characterization: comparison of different optimization methods A Akbalık, S Soulan, JH Tortai, D Fuard, I Kone, J Hazart, P Schiavone
Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009
14 2009 Microscale adhesion patterns for the precise localization of amoeba T Tzvetkova-Chevolleau, E Yoxall, D Fuard, F Bruckert, P Schiavone, ...
Microelectronic engineering 86 (4-6), 1485-1487, 2009
12 2009 Process for making a gate for a short channel CMOS transistor structure O Joubert, G Cunge, J Foucher, D Fuard, M Bonvalot, L Vallier
US Patent 6,818,488, 2004
10 2004 Process for the anisotropic etching of an organic dielectric polymer material by a plasma gas and application in microelectronics O Joubert, D Fuard
US Patent 6,326,302, 2001
8 2001 Poly-l -lysine/Laminin Surface Coating Reverses Glial Cell Mechanosensitivity on Stiffness-Patterned Hydrogels C Tomba, C Migdal, D Fuard, C Villard, A Nicolas
ACS Applied Bio Materials 5 (4), 1552-1563, 2022
7 2022 Hybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin films J Resende, D Fuard, D Le Cunff, JH Tortai, B Pelissier
Materials Chemistry and Physics 259, 124000, 2021
7 2021 Plasma polymerized methylsilane. III. Process optimization for 193 nm lithography applications O Joubert, D Fuard, C Monget, T Weidman
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
6 2000 Rapid mask prototyping for microfluidics BGC Maisonneuve, T Honegger, J Cordeiro, O Lecarme, T Thiry, D Fuard, ...
Biomicrofluidics 10 (2), 2016
5 2016 Tin hard mask cleans with sc1 solutions, for 64nm pitch beol patterning L Broussous, D Krejcirova, K Courouble, S Zoll, A Iwasaki, H Ishikawa, ...
Solid State Phenomena 219, 209-212, 2014
5 2014 Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications OP Joubert, D Fuard, C Monget, P Schiavone, O Toublan, A Prola, ...
Advances in Resist Technology and Processing XVI 3678, 1371-1380, 1999
5 1999 Cells on Hydrogels with Micron-Scaled Stiffness Patterns Demonstrate Local Stiffness Sensing A Mgharbel, C Migdal, N Bouchonville, P Dupenloup, D Fuard, ...
Nanomaterials 12 (4), 648, 2022
3 2022