Silicanin-1 is a conserved diatom membrane protein involved in silica biomineralization A Kotzsch, P Gröger, D Pawolski, PHH Bomans, NAJM Sommerdijk, ... BMC biology 15, 1-16, 2017 | 84 | 2017 |
Establishing super-resolution imaging for proteins in diatom biosilica P Gröger, N Poulsen, J Klemm, N Kröger, M Schlierf Scientific reports 6 (1), 36824, 2016 | 29 | 2016 |
Slow interconversion in a heterogeneous unfolded-state ensemble of outer-membrane phospholipase A G Krainer, P Gracia, E Frotscher, A Hartmann, P Gröger, S Keller, ... Biophysical Journal 113 (6), 1280-1289, 2017 | 28 | 2017 |
Bacterial initiators form dynamic filaments on single-stranded DNA monomer by monomer HM Cheng, P Gröger, A Hartmann, M Schlierf Nucleic acids research 43 (1), 396-405, 2015 | 21 | 2015 |
ATPase and protease domain movements in the bacterial AAA+ protease FtsH are driven by thermal fluctuations M Ruer, G Krainer, P Gröger, M Schlierf Journal of molecular biology 430 (22), 4592-4602, 2018 | 12 | 2018 |
CD and OCD sampling scheme optimization for HVM environment C Park, H Lee, D Lee, A Choi, S Buhl, WS Kim, P Groeger, S Guhlemann, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 3 | 2019 |
Optimizing focus and dose process windows for robust process control using a multi-feature analysis P Groeger, R Khurana, A Mitra, M Eggleston, S Buhl, WS Kim, X Thrun Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 2 | 2021 |
Real-time full-wafer design-based inter-layer virtual metrology L Yin, J Sturtevant, AL Gomez, S Shang, YC Kim, K Adam, M Chew, ... Metrology, Inspection, and Process Control for Microlithography XXXIV 11325 …, 2020 | 2 | 2020 |
Focus leveling improvement using optimized wafer edge settings L Lamonds, B Orf, M Frachel, X Thrun, G Erley, P Groeger, A Muehle, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (4), 043505-043505, 2019 | 2 | 2019 |
Quantifying CD-SEM contact hole roughness and shape combined with machine learning-based pattern fidelity scores for process optimization and monitoring H Lee, S Lee, H Rah, I Park, J Lee, J Sohn, Y Kim, C Ehrlich, P Groeger, ... Metrology, Inspection, and Process Control XXXVII 12496, 472-490, 2023 | 1 | 2023 |
An in-depth look at comprehensive and efficient methodology for CD uniformity budget breakdown U Denker, P Gröger, X Thrun, S Buhl, M Eggleston, N Doan, G Kawaguchi, ... Metrology, Inspection, and Process Control XXXVI 12053, 592-597, 2022 | 1 | 2022 |
Focus budget improvement using optimized wafer edge settings L Lamonds, B Orf, M Frachel, X Thrun, G Erley, P Groeger, B Habets, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 1 | 2019 |
An alternative to M+ 3S overlay dispositioning metric:‘number-of-dies-within-spec’ AL Gomez, S Buhl, E Jehnes, P Lomtscher, M Gutsch, X Thrun, C Utzny, ... Metrology, Inspection, and Process Control XXXVIII 12955, 932-936, 2024 | | 2024 |
Sampling plan optimization and process simulation for CD control U Denker, P Groeger, R Zech, C Ehrlich, T Koffas, S Davis Metrology, Inspection, and Process Control XXXVIII 12955, 641-648, 2024 | | 2024 |
Development of novel focus spot detection methods for high-volume manufacturing SN Mohammad, CJ Tsou, A Chiu, N Birnstein, E deGouw, C Utzny, ... Optical and EUV Nanolithography XXXVI 12494, 2023 | | 2023 |
Focus spot monitoring: design of an automatable detection, classification, and impact analysis pipeline SN Mohammad, S Boese, P Groeger, H Bald, A Lopez-Gomez, C Utzny, ... Optical and EUV Nanolithography XXXVI 12494, 2023 | | 2023 |
Method of manufacturing a semiconductor device and process control system for a semiconductor manufacturing assembly P Gröger US Patent 11,429,091, 2022 | | 2022 |
Advanced CD uniformity correction using radial basis function (RBF) models P Groeger, U Denker, R Zech, S Buhl, M Ruhm, M Kim, H Jang, C Kang, ... Metrology, Inspection, and Process Control XXXVI 12053, 368-381, 2022 | | 2022 |
Lithographic apparatus and method of controlling a lithographic apparatus S Buhl, P Groeger, W Kim US Patent 11,181,830, 2021 | | 2021 |
Wafer exposure method using wafer models and wafer fabrication assembly S Buhl, P Groeger, P Lomtscher US Patent 11,092,901, 2021 | | 2021 |