Hong Zhou
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Steep-slope hysteresis-free negative capacitance MoS 2 transistors
M Si, CJ Su, C Jiang, NJ Conrad, H Zhou, KD Maize, G Qiu, CT Wu, ...
Nature nanotechnology 13 (1), 24-28, 2018
High-Performance Depletion/Enhancement-ode -Ga2O3 on Insulator (GOOI) Field-Effect Transistors With Record Drain Currents of 600/450 mA/mm
H Zhou, M Si, S Alghamdi, G Qiu, L Yang, DY Peide
IEEE Electron Device Letters 38 (1), 103-106, 2016
β-Ga2O3 on insulator field-effect transistors with drain currents exceeding 1.5 A/mm and their self-heating effect
H Zhou, K Maize, G Qiu, A Shakouri, PD Ye
Applied Physics Letters 111 (9), 092102, 2017
Reduced surface leakage current and trapping effects in AlGaN/GaN high electron mobility transistors on silicon with passivation
ZH Liu, GI Ng, H Zhou, S Arulkumaran, YKT Maung
Applied Physics Letters 98 (11), 113506, 2011
Controlled growth of a large-size 2D selenium nanosheet and its electronic and optoelectronic applications
J Qin, G Qiu, J Jian, H Zhou, L Yang, A Charnas, DY Zemlyanov, CY Xu, ...
ACS nano 11 (10), 10222-10229, 2017
Improved subthreshold swing and short channel effect in FDSOI n-channel negative capacitance field effect transistors
D Kwon, K Chatterjee, AJ Tan, AK Yadav, H Zhou, AB Sachid, R Dos Reis, ...
IEEE Electron Device Letters 39 (2), 300-303, 2017
Field-Plated Lateral-Ga2O3Schottky Barrier Diode With High Reverse Blocking Voltage of More Than 3 kV and High DC Power Figure-of-Merit of 500 MW/cm2
Z Hu, H Zhou, Q Feng, J Zhang, C Zhang, K Dang, Y Cai, Z Feng, Y Gao, ...
IEEE Electron Device Letters 39 (10), 1564-1567, 2018
Al2O3/ -Ga2O3(-201) Interface Improvement Through Piranha Pretreatment and Postdeposition Annealing
H Zhou, S Alghmadi, M Si, G Qiu, DY Peide
IEEE Electron Device Letters 37 (11), 1411-1414, 2016
Temperature-dependent forward gate current transport in atomic-layer-deposited metal-insulator-semiconductor high electron mobility transistor
ZH Liu, GI Ng, S Arulkumaran, YKT Maung, H Zhou
Applied Physics Letters 98 (16), 163501, 2011
Observation of Optical and Electrical In-Plane Anisotropy in High-Mobility Few-Layer ZrTe5
G Qiu, Y Du, A Charnas, H Zhou, S Jin, Z Luo, DY Zemlyanov, X Xu, ...
Nano letters 16 (12), 7364-7369, 2016
Performance enhancement of black phosphorus field-effect transistors by chemical doping
Y Du, L Yang, H Zhou, DY Peide
IEEE Electron Device Letters 37 (4), 429-432, 2016
Thermodynamic Studies of β-Ga2O3 Nanomembrane Field-Effect Transistors on a Sapphire Substrate
H Zhou, K Maize, J Noh, A Shakouri, PD Ye
ACS omega 2 (11), 7723-7729, 2017
Charge Trapping in Al2O3/-Ga2O3-Based MOS Capacitors
MA Bhuiyan, H Zhou, R Jiang, EX Zhang, DM Fleetwood, DY Peide, ...
IEEE Electron Device Letters 39 (7), 1022-1025, 2018
High-performance InAlN/GaN MOSHEMTs enabled by atomic layer epitaxy MgCaO as gate dielectric
H Zhou, X Lou, NJ Conrad, M Si, H Wu, S Alghamdi, S Guo, RG Gordon, ...
IEEE Electron Device Letters 37 (5), 556-559, 2016
Improved device performance by post-oxide annealing in atomic-layer-deposited Al2O3/AlGaN/GaN metal–insulator–semiconductor high electron mobility transistor on Si
H Zhou, GI Ng, ZH Liu, S Arulkumaran
Applied physics express 4 (10), 104102, 2011
First experimental demonstration of Ge 3D FinFET CMOS circuits
H Wu, W Luo, H Zhou, M Si, J Zhang, DY Peide
2015 Symposium on VLSI Technology (VLSI Technology), T58-T59, 2015
Epitaxial Growth of MgxCa1–xO on GaN by Atomic Layer Deposition
X Lou, H Zhou, SB Kim, S Alghamdi, X Gong, J Feng, X Wang, PD Ye, ...
Nano letters 16 (12), 7650-7654, 2016
β-Ga2O3 Nanomembrane Negative Capacitance Field-Effect Transistors with Steep Subthreshold Slope for Wide Band Gap Logic Applications
M Si, L Yang, H Zhou, PD Ye
ACS omega 2 (10), 7136-7140, 2017
High-Voltage β-Ga 2 O 3 Schottky Diode with Argon-Implanted Edge Termination
Y Gao, A Li, Q Feng, Z Hu, Z Feng, K Zhang, X Lu, C Zhang, H Zhou, ...
Nanoscale research letters 14 (1), 1-8, 2019
High-Performance Vertical -Ga2O3 Schottky Barrier Diode With Implanted Edge Termination
H Zhou, Q Yan, J Zhang, Y Lv, Z Liu, Y Zhang, K Dang, P Dong, Z Feng, ...
IEEE Electron Device Letters 40 (11), 1788-1791, 2019
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