A review of plasma-assisted catalytic conversion of gaseous carbon dioxide and methane into value-added platform chemicals and fuels H Puliyalil, DL Jurković, VDBC Dasireddy, B Likozar RSC advances 8 (48), 27481-27508, 2018 | 186 | 2018 |
Selective plasma etching of polymeric substrates for advanced applications H Puliyalil, U Cvelbar Nanomaterials 6 (6), 108, 2016 | 128 | 2016 |
White paper on the future of plasma science and technology in plastics and textiles U Cvelbar, JL Walsh, M Černák, HW de Vries, S Reuter, T Belmonte, ... Plasma Processes and Polymers 16 (1), 1700228, 2019 | 93 | 2019 |
Capacitor-less, long-retention (> 400s) DRAM cell paving the way towards low-power and high-density monolithic 3D DRAM A Belmonte, H Oh, N Rassoul, GL Donadio, J Mitard, H Dekkers, ... 2020 IEEE International Electron Devices Meeting (IEDM), 28.2. 1-28.2. 4, 2020 | 81 | 2020 |
An intensified atmospheric plasma-based process for the isolation of the chitin biopolymer from waste crustacean biomass M Borić, H Puliyalil, U Novak, B Likozar Green Chemistry 20 (6), 1199-1204, 2018 | 60 | 2018 |
In-situ cure and cure kinetic analysis of a liquid rubber modified epoxy resin R Thomas, C Sinturel, J Pionteck, H Puliyalil, S Thomas Industrial & engineering chemistry research 51 (38), 12178-12191, 2012 | 43 | 2012 |
Hydrothermal synthesis of rare-earth modified titania: Influence on phase composition, optical properties, and photocatalytic activity N Rozman, DM Tobaldi, U Cvelbar, H Puliyalil, JA Labrincha, A Legat, ... Materials 12 (5), 713, 2019 | 42 | 2019 |
Tailoring IGZO-TFT architecture for capacitorless DRAM, demonstrating > 103s retention, >1011 cycles endurance and Lg scalability down to 14nm A Belmonte, H Oh, S Subhechha, N Rassoul, H Hody, H Dekkers, ... 2021 IEEE International Electron Devices Meeting (IEDM), 10.6. 1-10.6. 4, 2021 | 33 | 2021 |
Plasma‐activated methane partial oxidation reaction to oxygenate platform chemicals over Fe, Mo, Pd and zeolite catalysts D Lašič Jurković, H Puliyalil, A Pohar, B Likozar International Journal of Energy Research 43 (14), 8085-8099, 2019 | 32 | 2019 |
First demonstration of sub-12 nm Lg gate last IGZO-TFTs with oxygen tunnel architecture for front gate devices S Subhechha, N Rassoul, A Belmonte, R Delhougne, K Banerjee, ... 2021 Symposium on VLSI Technology, 1-2, 2021 | 31 | 2021 |
Plasma as a tool for enhancing insulation properties of polymer composites H Puliyalil, U Cvelbar, G Filipič, AD Petrič, R Zaplotnik, N Recek, ... RSC Advances 5 (47), 37853-37858, 2015 | 25 | 2015 |
Corrosion studies of plasma modified magnesium alloy in simulated body fluid (SBF) solutions HR Tiyyagura, H Puliyalil, G Filipič, KC Kumar, YB Pottathara, R Rudolf, ... Surface and Coatings Technology 385, 125434, 2020 | 19 | 2020 |
Selective plasma etching of polymers and polymer matrix composites H Puliyalil, G Filipič, U Cvelbar Non-Thermal Plasma Technology for Polymeric Materials, 241-259, 2019 | 19 | 2019 |
Smallest Bimetallic CoPt3 Superparamagnetic Nanoparticles M Karmaoui, JS Amaral, L Lajaunie, H Puliyalil, DM Tobaldi, RC Pullar, ... The journal of physical chemistry letters 7 (20), 4039-4046, 2016 | 17 | 2016 |
Plasma-enabled sensing of urea and related amides on polyaniline H Puliyalil, P Slobodian, M Sedlacik, R Benlikaya, P Riha, K Ostrikov, ... Frontiers of Chemical Science and Engineering 10, 265-272, 2016 | 15 | 2016 |
Recent advances in the methods for designing superhydrophobic surfaces H Puliyalil, G Filipič, U Cvelbar InTech: Rijeka, Croatia, 311-335, 2015 | 15 | 2015 |
Three-layer BEOL process integration with supervia and self-aligned-block options for the 3 nm node V Vega-Gonzalez, CJ Wilson, B Briggs, S Decoster, J Versluijs, ... 2019 IEEE International Electron Devices Meeting (IEDM), 19.3. 1-19.3. 4, 2019 | 14 | 2019 |
12-EUV layer surrounding gate transistor (SGT) for vertical 6-T SRAM: 5-nm-class technology for ultra-density logic devices MS Kim, N Harada, Y Kikuchi, J Boemmels, J Mitard, T Huynh-Bao, ... 2019 Symposium on VLSI Technology, T198-T199, 2019 | 10 | 2019 |
Ultra-low Leakage IGZO-TFTs with Raised Source/Drain for Vt > 0 V and Ion > 30 µA/µm S Subhechha, N Rassoul, A Belmonte, H Hody, H Dekkers, MJ van Setten, ... 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2022 | 9 | 2022 |
Selective Plasma Etching of Polyphenolic Composite in O2/Ar Plasma for Improvement of Material Tracking Properties H Puliyalil, G Filipič, U Cvelbar Plasma Processes and Polymers 13 (7), 737-743, 2016 | 8 | 2016 |