Sean King

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36 articles

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Robert J. NemanichDepartment of Physics, Arizona State UniversityAdresse e-mail validée de asu.edu
Robert F. DavisCarnegie Mellon UniversityAdresse e-mail validée de andrew.cmu.edu
William A LanfordProfessor of Physics, University at Albany SUNYAdresse e-mail validée de albany.edu
Michelle M. PaquetteDepartment of Physics, University of Missouri - Kansas CityAdresse e-mail validée de umkc.edu
Markus KuhnRigaku CorporationAdresse e-mail validée de rigaku.com
P.M. LenahanDistinguished Professor of Engineering Science and Mecahnics and Co-Chair, Inter-College GraduateAdresse e-mail validée de engr.psu.edu
Patrick E. HopkinsUniversity of VirginiaAdresse e-mail validée de virginia.edu
Bradley Joseph NordellResearch Scientist, University of Missouri-Kansas CityAdresse e-mail validée de umkc.edu
John T. GaskinsCEO, Laser ThermalAdresse e-mail validée de laserthermal.com
Gheorghe StanNational Institute of Standards and TechnologyAdresse e-mail validée de nist.gov
Patrick HenryFluor Marine Propulsion, IncAdresse e-mail validée de unnpp.gov
Han LiIntel CorpAdresse e-mail validée de intel.com
Justin BrockmanAppleAdresse e-mail validée de Apple.com
Carsten RonningFriedrich Schiller University Jena, Institute for Solid State PhysicsAdresse e-mail validée de uni-jena.de
Yusuke MatsudaQuantum-SiAdresse e-mail validée de quantum-si.com
Reinhold H. DauskardtRuth G. and William K. Bowes Professor, Stanford UniversityAdresse e-mail validée de stanford.edu
Donghyi KohUniversity of Texas at AustinAdresse e-mail validée de utexas.edu
Brad BittelAdresse e-mail validée de intel.com
Prof. Dr. Marius OrlowskiVirginia Tech, Bradly Department of Electrical and Computer EngineeeringAdresse e-mail validée de vt.edu
Dhanadeep DuttaRadiochemistry Division, Bhabha Atomic Research Centre, Mumbai, IndiaAdresse e-mail validée de barc.gov.in

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Sean King

Principal Engineer

Adresse e-mail validée de intel.com

Materials Science


Titre Trier par citations Trier par année Trier par titre	Citée par Citée par	Année
Cleaning of AlN and GaN surfaces SW King, JP Barnak, MD Bremser, KM Tracy, C Ronning, RF Davis, ... Journal of applied physics 84 (9), 5248-5260, 1998	401	1998
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate A Ott, S King, A Sharma US Patent 8,120,114, 2012	400	2012
Adhesion and electromigration performance at an interface between a dielectric and metal S King, J Klaus US Patent 8,178,436, 2012	385	2012
Plasma enhanced atomic layer deposition of SiNx: H and SiO2 SW King Journal of Vacuum Science & Technology A 29 (4), 2011	208	2011
Selective deposition of amorphous silicon films on metal gates J Klaus, S King, W Rachmady US Patent 7,816,218, 2010	197	2010
Cleaning of GaN surfaces LL Smith, SW King, RJ Nemanich, RF Davis Journal of electronic materials 25 (5), 805-810, 1996	196	1996
Dielectric barrier, etch stop, and metal capping materials for state of the art and beyond metal interconnects SW King ECS Journal of Solid State Science and Technology 4 (1), N3029, 2014	181	2014
UV photoemission study of heteroepitaxial AlGaN films grown on 6H-SiC MC Benjamin, MD Bremser, TW Weeks Jr, SW King, RF Davis, ... Applied Surface Science 104, 455-460, 1996	152	1996
Negative electron affinity surfaces of aluminum nitride and diamond RJ Nemanich, PK Baumann, MC Benjamin, ... Diamond Relat. Mater 5 (6), 790-796, 1996	135	1996
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC: H thin films SW King, M French, J Bielefeld, WA Lanford Journal of Non-Crystalline Solids 357 (15), 2970-2983, 2011	115	2011
Thermal conductivity and thermal boundary resistance of atomic layer deposited high-k dielectric aluminum oxide, hafnium oxide, and titanium oxide thin films on … EA Scott, JT Gaskins, SW King, PE Hopkins APL Materials 6 (5), 058302, 2018	113	2018
Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum … JT Gaskins, PE Hopkins, DR Merrill, SR Bauers, E Hadland, DC Johnson, ... ECS Journal of Solid State Science and Technology 6 (10), N189-N208, 2017	109	2017
Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes N Alimardani, SW King, BL French, C Tan, BP Lampert, JF Conley Journal of Applied Physics 116 (2), 2014	99	2014
Dependence of (0001) GaN/AlN valence band discontinuity on growth temperature and surface reconstruction SW King, C Ronning, RF Davis, MC Benjamin, RJ Nemanich Journal of applied physics 84 (4), 2086-2090, 1998	94	1998
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC: H thin films SW King, J Bielefeld, G Xu, WA Lanford, Y Matsuda, RH Dauskardt, N Kim, ... Journal of Non-Crystalline Solids 379, 67-79, 2013	85	2013
Research Updates: The three M's (materials, metrology, and modeling) together pave the path to future nanoelectronic technologies SW King, H Simka, D Herr, H Akinaga, M Garner APL Materials 1 (4), 040701, 2013	82	2013
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiN x: H films S King, R Chu, G Xu, J Huening Thin Solid Films 518 (17), 4898-4907, 2010	78	2010
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal AK Sharma, S King, D Hanken, AW Ott US Patent 7,790,631, 2010	77	2010
Film property requirements for hermetic low-k a-SiOxCyNz: H dielectric barriers SW King, D Jacob, D Vanleuven, B Colvin, J Kelly, M French, J Bielefeld, ... ECS Journal of Solid State Science and Technology 1 (6), N115, 2012	72	2012
Wet Chemical Processing of (0001) Si 6H‐SiC Hydrophobic and Hydrophilic Surfaces SW King, RJ Nemanich, RF Davisa Journal of the Electrochemical Society 146 (5), 1910-1917, 1999	72	1999

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