| Spacer formation O Luere, SS Kang, SD Nemani US Patent 9,269,590, 2016 | 500 | 2016 |
| Method for material removal in dry etch reactor O Luere, SD Nemani, SS Kang US Patent App. 14/164,679, 2015 | 178 | 2015 |
| Wafer edge ring lifting solution MR Rice, YS VISHWANATH, S Srinivasan, R Dhindsa, SE Babayan, ... US Patent 11,393,710, 2022 | 71 | 2022 |
| Adjustable extended electrode for edge uniformity control O Luere, L Dorf, R Dhindsa, S Srinivasan, DM Koosau, J Rogers US Patent 10,504,702, 2019 | 49 | 2019 |
| Processing with powered edge ring L Dorf, AK Mishra, O Luere, R Dhindsa, J Rogers, DM Koosau, ... US Patent App. 16/253,655, 2019 | 40 | 2019 |
| Method of controlling ion energy distribution using a pulse generator with a current-return output stage L Dorf, O Luere, R Dhindsa, J Rogers, S Srinivasan, AK Mishra US Patent 10,555,412, 2020 | 38 | 2020 |
| Systems and methods for controlling a voltage waveform at a substrate during plasma processing L Dorf, JH Rogers, O Luere, T Koh, R Dhindsa, S Srinivasan US Patent App. 15/618,082, 2017 | 38 | 2017 |
| Method of controlling ion energy distribution using a pulse generator with a current-return output stage L Dorf, O Luere, R Dhindsa, J Rogers, S Srinivasan, AK Mishra US Patent 10,448,494, 2019 | 35 | 2019 |
| Composite edge ring O Joubert, JA Kenney, S Srinivasan, J Rogers, R Dhindsa, ... US Patent App. 29/561,163, 2017 | 34 | 2017 |
| Creating ion energy distribution functions (IEDF) L Dorf, T Koh, O Luere, O Joubert, PA Kraus, R Dhindsa, JH Rogers US Patent 10,312,048, 2019 | 32 | 2019 |
| Apparatus and method of forming plasma using a pulsed waveform L Dorf, E Kamenetskiy, J Rogers, O Luere, R Dhindsa, V Plotnikov US Patent 10,916,408, 2021 | 31 | 2021 |
| Method of controlling ion energy distribution using a pulse generator with a current-return output stage L Dorf, O Luere, R Dhindsa, J Rogers, S Srinivasan, AK Mishra US Patent 10,791,617, 2020 | 30 | 2020 |
| Method of controlling ion energy distribution using a pulse generator with a current-return output stage L Dorf, O Luere, R Dhindsa, J Rogers, S Srinivasan, AK Mishra US Patent 10,448,495, 2019 | 30 | 2019 |
| Apparatus and method of generating a pulsed waveform L Dorf, E Kamenetskiy, J Rogers, O Luere, R Dhindsa, V Plotnikov US Patent 10,923,321, 2021 | 29 | 2021 |
| Adjustable extended electrode for edge uniformity control O Luere, L Dorf, S Srinivasan, R Dhindsa, J Rogers, DM Koosau US Patent 10,553,404, 2020 | 29 | 2020 |
| Adjustable extended electrode for edge uniformity control O Luere, L Dorf, R Dhindsa, S Srinivasan, DM Koosau, J Rogers US Patent 9,947,517, 2018 | 26 | 2018 |
| Etch mechanisms of silicon gate structures patterned in SF6/CH2F2/Ar inductively coupled plasmas O Luere, E Pargon, L Vallier, B Pelissier, O Joubert Journal of Vacuum Science & Technology B 29 (1), 2011 | 24 | 2011 |
| Etch mechanisms of silicon gate structures patterned in SF6/CH2F2/Ar inductively coupled plasmas O Luere, E Pargon, L Vallier, B Pelissier, O Joubert Journal of Vacuum Science & Technology B 29 (1), 2011 | 24 | 2011 |
| Method of controlling ion energy distribution using a pulse generator L Dorf, O Luere, R Dhindsa, J Rogers, S Srinivasan, AK Mishra US Patent 11,284,500, 2022 | 23 | 2022 |
| Adjustable extended electrode for edge uniformity control O Luere, L Dorf, R Dhindsa, S Srinivasan, DM Koosau, J Rogers US Patent 10,103,010, 2018 | 23 | 2018 |
