| Semiconductor processing apparatus with compact free radical source AY Kovalgin, AAI Aarnink US Patent App. 13/918,094, 2013 | 377 | 2013 |
| Selective deposition of tungsten AY Kovalgin, M Yang, AAI Aarnink, RAM Wolters US Patent 10,714,385, 2020 | 362 | 2020 |
| Selective deposition of tungsten AY Kovalgin, M Yang, AAI Aarnink, RAM Wolters US Patent App. 16/926,192, 2020 | 232 | 2020 |
| CO interaction with the surface of thermally activated CaO and MgO MA Babaeva, DS Bystrov, AY Kovalgin, AA Tsyganenko Journal of Catalysis 123 (2), 396-416, 1990 | 120 | 1990 |
| Systematic TLM measurements of NiSi and PtSi specific contact resistance to n-and p-type Si in a broad doping range N Stavitski, MJH Van Dal, A Lauwers, C Vrancken, AY Kovalgin, ... IEEE electron device letters 29 (4), 378-381, 2008 | 106 | 2008 |
| Growth kinetics and oxidation mechanism of ALD TiN thin films monitored by in situ spectroscopic ellipsometry H Van Bui, AW Groenland, AAI Aarnink, RAM Wolters, J Schmitz, ... Journal of the Electrochemical Society 158 (3), H214, 2011 | 77 | 2011 |
| Cross-bridge Kelvin resistor structures for reliable measurement of low contact resistances and contact interface characterization N Stavitski, JH Klootwijk, HW van Zeijl, AY Kovalgin, RAM Wolters IEEE transactions on semiconductor manufacturing 22 (1), 146-152, 2009 | 62 | 2009 |
| Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films H Van Bui, FB Wiggers, A Gupta, MD Nguyen, AAI Aarnink, MP de Jong, ... Journal of Vacuum Science & Technology A 33 (1), 2015 | 61 | 2015 |
| From Single Atoms to Nanoparticles: Autocatalysis and Metal Aggregation in Atomic Layer Deposition of Pt on TiO2 Nanopowder F Grillo, H Van Bui, D La Zara, AAI Aarnink, AY Kovalgin, P Kooyman, ... Small 14 (23), 1800765, 2018 | 59 | 2018 |
| On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films H Van Bui, AY Kovalgin, RAM Wolters Applied surface science 269, 45-49, 2013 | 59 | 2013 |
| Self-limiting growth and thickness-and temperature-dependence of optical constants of ALD AlN thin films H Van Bui, MD Nguyen, FB Wiggers, AAI Aarnink, MP de Jong, ... ECS journal of solid state science and technology 3 (4), P101, 2014 | 45 | 2014 |
| Evaluation of transmission line model structures for silicide-to-silicon specific contact resistance extraction N Stavitski, MJH Van Dal, A Lauwers, C Vrancken, AY Kovalgin, ... IEEE transactions on electron devices 55 (5), 1170-1176, 2008 | 33 | 2008 |
| Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry AY Kovalgin, M Yang, S Banerjee, RO Apaydin, AAI Aarnink, S Kinge, ... Advanced materials interfaces 4 (18), 1700058, 2017 | 32 | 2017 |
| Integration of solar cells on top of CMOS chips part I: A-Si solar cells J Lu, AY Kovalgin, KHM van der Werf, REI Schropp, J Schmitz IEEE transactions on electron devices 58 (7), 2014-2021, 2011 | 31 | 2011 |
| Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD A Boogaard, AY Kovalgin, I Brunets, AAI Aarnink, J Holleman, ... Surface and Coatings Technology 201 (22-23), 8976-8980, 2007 | 31 | 2007 |
| PEALD AlN: Controlling growth and film crystallinity S Banerjee, AAI Aarnink, R van de Kruijs, AY Kovalgin, J Schmitz physica status solidi (c) 12 (7), 1036-1042, 2015 | 30 | 2015 |
| Interaction of epitaxial silicene with overlayers formed by exposure to Al atoms and O2 molecules R Friedlein, H Van Bui, FB Wiggers, Y Yamada-Takamura, AY Kovalgin, ... The Journal of chemical physics 140 (20), 2014 | 27 | 2014 |
| Chemical modeling of a high-density inductively-coupled plasma reactor containing silane AY Kovalgin, A Boogaard, I Brunets, J Holleman, J Schmitz Surface and Coatings Technology 201 (22-23), 8849-8853, 2007 | 26 | 2007 |
| Conduction and electric field effect in ultra-thin TiN films H Van Bui, AY Kovalgin, J Schmitz, RAM Wolters Applied physics letters 103 (5), 2013 | 25 | 2013 |
| Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices I Brunets, AAI Aarnink, A Boogaard, AY Kovalgin, RAM Wolters, ... Surface and Coatings Technology 201 (22-23), 9209-9214, 2007 | 25 | 2007 |
