Jean-François PIERSON
Jean-François PIERSON
Full Professor - Institut Jean Lamour - Université de Lorraine (F)
Adresse e-mail validée de univ-lorraine.fr
TitreCitée parAnnée
Vibrational properties of CuO and Cu4O3 from first-principles calculations, and Raman and infrared spectroscopy
L Debbichi, MC Marco de Lucas, JF Pierson, P Kruger
The Journal of Physical Chemistry C 116 (18), 10232-10237, 2012
2422012
Cuprite, paramelaconite and tenorite films deposited by reactive magnetron sputtering
JF Pierson, A Thobor-Keck, A Billard
Applied surface science 210 (3-4), 359-367, 2003
2302003
Reactive magnetron sputtering of copper, silver, and gold
JF Pierson, D Wiederkehr, A Billard
Thin Solid Films 478 (1-2), 196-205, 2005
1752005
Structure and properties of copper nitride films formed by reactive magnetron sputtering
JF Pierson
Vacuum 66 (1), 59-64, 2002
1282002
Stability of reactively sputtered silver oxide films
JF Pierson, C Rousselot
Surface and Coatings Technology 200 (1-4), 276-279, 2005
1012005
Reactively sputtered zirconium nitride coatings: structural, mechanical, optical and electrical characteristics
D Pilloud, AS Dehlinger, JF Pierson, A Roman, L Pichon
Surface and Coatings Technology 174, 338-344, 2003
872003
Structural, electrical, optical, and mechanical characterizations of decorative thin films
P Carvalho, F Vaz, L Rebouta, L Cunha, CJ Tavares, C Moura, E Alves, ...
Journal of applied physics 98 (2), 023715, 2005
842005
Structural changes in Zr–Si–N films vs. their silicon content
D Pilloud, JF Pierson, AP Marques, A Cavaleiro
Surface and Coatings Technology 180, 352-356, 2004
792004
Asymmetric electrochemical capacitor microdevice designed with vanadium nitride and nickel oxide thin film electrodes
E Eustache, R Frappier, RL Porto, S Bouhtiyya, JF Pierson, T Brousse
Electrochemistry Communications 28, 104-106, 2013
732013
Transmittance enhancement and optical band gap widening of Cu2O thin films after air annealing
Y Wang, P Miska, D Pilloud, D Horwat, F Mücklich, JF Pierson
Journal of Applied Physics 115 (7), 073505, 2014
692014
Influence of the nanostructuration of PVD hard TiN-based films on the durability of coated steel
P Steyer, A Mege, D Pech, C Mendibide, J Fontaine, JF Pierson, C Esnouf, ...
Surface and Coatings Technology 202 (11), 2268-2277, 2008
612008
VN thin films as electrode materials for electrochemical capacitors
R Lucio-Porto, S Bouhtiyya, JF Pierson, A Morel, F Capon, P Boulet, ...
Electrochimica Acta 141, 203-211, 2014
602014
Influence of silicon addition on the oxidation resistance of CrN coatings
A Thobor-Keck, F Lapostolle, AS Dehlinger, D Pilloud, JF Pierson, ...
Surface and Coatings Technology 200 (1-4), 264-268, 2005
602005
Electronic structures of , and CuO: A joint experimental and theoretical study
Y Wang, S Lany, J Ghanbaja, Y Fagot-Revurat, YP Chen, F Soldera, ...
Physical Review B 94 (24), 245418, 2016
572016
Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices
S Bouhtiyya, RL Porto, B Laïk, P Boulet, F Capon, JP Pereira-Ramos, ...
Scripta Materialia 68 (9), 659-662, 2013
512013
Addition of silver in copper nitride films deposited by reactive magnetron sputtering
JF Pierson, D Horwat
Scripta Materialia 58 (7), 568-570, 2008
512008
Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering
JM Chappé, N Martin, JF Pierson, G Terwagne, J Lintymer, J Gavoille, ...
Applied Surface Science 225 (1-4), 29-38, 2004
502004
Oxidation resistance improvement of arc-evaporated TiN hard coatings by silicon addition
P Steyer, D Pilloud, JF Pierson, JP Millet, M Charnay, B Stauder, ...
Surface and Coatings Technology 201 (7), 4158-4162, 2006
482006
Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering
M Fenker, H Kappl, O Banakh, N Martin, JF Pierson
Surface and Coatings Technology 201 (7), 4152-4157, 2006
432006
Property change in multifunctional TiCxOy thin films: Effect of the O/Ti ratio
AC Fernandes, P Carvalho, F Vaz, S Lanceros-Méndez, AV Machado, ...
Thin Solid Films 515 (3), 866-871, 2006
422006
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